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脉冲高能量密度等离子体是一项全新的等离子体材料表面处理和薄膜制备技术。
The use of pulsed high energy density plasma is a new low temperature plasma technology for material surface treatment and thin film deposition.
用高能量密度脉冲等离子体于室温下在氮化硅陶瓷刀具上成功沉积了高硬耐磨的氮化钛涂层。
Hard and wear-resistant titanium nitride coatings were deposited by pulsed high energy density plasma technique on silicon nitride ceramic cutting tools at ambient temperature.
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