指定用图形方法程序输出的线条宽度。

Specifies the line width for output from graphics methods.

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对曝光电子的能量和线条宽度之间的关系进行了分析。

The relation between the electron exposure energy and the line width is analyzed.

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对薄层电阻、接触、光掩模对准、线条宽度、器件参数与掺杂的相关性等内容进行了初步试验和分析。

The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.

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