介绍了等离子体化学工艺，特别着重介绍了溅射镀膜与等离子体化学气相沉积在粉末冶金中的应用。
This article introduces processing of plasma chemistry and application of sputter coating and plasma-enhanced chemical vapor deposition in powder metallurgy especially.
本文介绍了等离子增强磁控溅射沉积技术。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
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