和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比，低压等离子体喷涂具有明显的优势。
The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.
在无氧铜的基体上制备了等离子喷涂钨基涂层以应用于核聚变反应堆中偏滤器部件的面向等离子体材料。比较了不同过渡层对等离子喷涂钨基涂层结合强度的影响。
The plasma sprayed tungsten coatings were prepared on oxygen free copper substrates, which are to be used as the plasma-facing materials of the divergent components in fusion reactors.
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