... ion irradiation 离子辐射 ion machining 离子加工 ion motion model 离子运动模型 ...
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等离子加工 pm ; plasma machining
离子束加工 [机] ion beam machining ; Ion Beam Figuring ; Ion beam processing ; IBM
离子束加工设备 ion beam machining equipment ; ion beam process equipment
等离子射流加工 PJM
等离子电弧加工 pam ; plasma arc machining
对阴离子诱导加工性 Conter-Ion Induced Processibility
等离子弧加工 plasma arc processing
等离子体加工 plasma processing
聚焦离子束微细加工 FIBM
晶片等离子体加工室的结构设置成使反应性自由基与放置在晶片等离子体加工室内的晶片表面上的物质反应。
The wafer plasma processing chamber is configured to react the reactive radical with a species at a surface of a wafer disposed in the wafer plasma processing chamber.
最后,采用各项异性的离子束(IBM)加工技术可以通过掩膜来蚀刻孔阵,以制成纳米多孔金属材料。
Last, a technique known as anisotropic ion beam milling (IBM) is used to etch through the mask to make an array of holes, creating the nanoporous metal.
利用射频鞘层模型,推出了离子到达被加工材料表面时的动量的表达式。
Based on the rf (radio frequency) sheath model, the equation for ion momentum when reaching the material surface was derived.
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