本文介绍了等离子增强磁控溅射沉积技术。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
对铀表面磁控溅射沉积铝镀层的热应力进行了热弹塑性有限元分析。
The thermal stress in magnetron sputtered al coating on uranium substrate was studied by thermal elastic plastic finite element method (FEM).
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
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