射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
用低压等离子体分解硅烷和NF 3以及用放电等离子体处理汽车等的排入废气。
Adecomposition of silane and NF3 by low pressure plasma and waste as treatment by non-thermal discharge plasma are discussed.
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