为实现电子束曝光机扫描场的线性畸变校正，设计了图形发生器的成像系统，该系统包括硬件和软件两部分。
An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.
论述了电子束扫描正交图形簇产生畸变的非线性校正过程。
The process of nonlinear distortion correction of orthogonal pattern group in E-beam scanning is introduced.
光刻过程中由于光的衍射效应产生的非线性畸变对光刻面形质量具有严重影响，是造成光刻微结构图形失真的主要原因之一。
Nonlinear distortion caused by diffraction in the lithography process has severely affected the quality of surface profile, which is the main reason for pattern distortion in lithography.
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