AEBB - 2000加速器是一部特殊的设备，它能实现高能量的反平行电子-正电子束试验。
The AEBB-2000 accelerator is a unique facility for carrying out experiments with anti-parallel electron-positron beams of high energies.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
介绍国内第一条电子束钢带镀膜生产线的情况，对钢带镀膜的一些工艺及设备技术问题进行分析探讨。
Brief introduce the first production line of electron beam strip coating in nation. Analyze and discuss some technical and facility problems in electron beam strip coating.
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