... electron beam processing 电子束加工 electron beam projection 电子束投影 electron beam projector 电子枪 ...
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缩图式电子束投影 demagnifying electron projection
缩小式电子束投影系统 reducing electron beam projection system
电子束投影光刻 electron projection lithography
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
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