电子束曝光技术这些优势使电子束曝光技术不仅在掩模版制作方面一直处于主流地位而且将在纳米器件的研制和生产中发挥重要作用。
All these advantages make the technology not only be in the major position but also play an important part in the research and production of nanometer device.
光刻是大规模集成电路生产流程中十分关键的一环，而光刻中使用的掩模的质量对大规模集成电路的成品率有很大的影响。
In the manufacture process of integrated circuit (IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.
单片机的掩模 ROM 集成到单片机中，并在生产单片机时一次性编程写入。
The mask-programmed read only memory of the microcontroller is integrated into the microcontroller and programmed once and for all during manufacture of the microcontroller.
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