该溅射源与现有的用于大批量生产的立式串级系统完全兼容。
The source is fully compatible with existing vertical In-Line systems for high volume production.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
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