刷新率的变化和黑栅衍射效应将导致衍射效率下降，使得曝光深度误差增加。
The variation of refresh rate and diffraction by opaque lattice will lead to reducing diffraction efficiency and this will increase exposure depth error.
为了保证在第一版掩膜版和第二版在套刻曝光的时候，能够精准的吻合进行套刻，并降低误差对结果的影响。
In order to ensure the mask in the first edition and second edition in exposure time, to coincide precisely and reduce errors.
改变源片距离和曝光剂量，进一步突出所能发现的误差，确定最佳曝光条件；
Then, exposure conditions including the exposure dose and source to film distance were changed to find the optimal one.
应用推荐