在厚胶光刻工艺中重点解决了胶膜厚度的均匀性、胶膜与衬底的粘附性、大厚度差胶层的曝光、显影条件等的优化问题。
Uniformity of the photoresist film, adhesiveness between underlay and glue film, exposal and develop condition of high thickness difference are all solved in the thesis.
以及改变单元，用于根据与所选择的显示模式相对应的阈值以及所述差的值，改变用于获取所述实时取景图像的曝光条件。
The image capturing apparatus allows for control of the exposure conditions for acquiring the live view images in accordance with the selected live view display mode.
某些感光乳剂差激光更敏锐一些， 也不离更便当功曝光。
Some sensitive emulsion more sensitive to the laser, it is much easier to overexposure.
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