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针对超精密光滑光学元件加工过程中容易出现的粗糙度较大和表面疵病较多的现象，对传统抛光机理和抛光过程中抛光粉的主要参量对抛光质量的影响进行了研究。
In view of the phenomena that the easy appearance of serious roughness and surface defects, the polishing mechanism and the influence of the main parameters on the polishing quality are researched.
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