实验上，我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片，并量测该试片的反射频谱和接触角。
We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating. The performance is evaluated by measuring the reflectance spectrum and contact angle.
他们可以利用软微影术制造一片东西，上面戳有数百个直径10 ~ 100微米的小孔，然后将之覆盖在另一表面上。
A sheet molded with hundreds of perforations, from 10 to 100 microns across, can be manufactured using soft lithography and set down on another surface.
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