在感染后期，数以百万计的新病毒颗粒形成并包裹在多面体晶体中。
Late in the course of the infection, millions of new virus particles are formed and enclosed in polyhedron crystals.
然后在氧等离子体中用电子束刻蚀法去除沟道区石墨烯形成晶体管的沟道。
They then defined the transistor channel using electron-beam lithography, removing graphene outside of channel regions with an oxygen plasma.
由于矿物晶体生长过程中点缺陷和线缺陷容易愈合，多数包裹体以这两种模式形成。
Because the inclusions trapped in point defect and the line defect modes can be easily healed during the growth of mineral crystals, most inclusions formed in these two modes.
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