多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
为了对颗粒表面进行改性，在自行设计组装的流化床反应器中，利用化学气相沉积法(CVD)制备了不同的复合颗粒。
In order to modify the surface properties of the particles, composite particles are prepared by the process of Chemical Vapor Deposition (CVD) in a fluidized bed reactor.
减少反应器内部的自由空间，是提高流场品质和化学气相沉积效果的关键。
It is key to improve the chemical vapor infiltration quality that reducing the free-space in the CVI reactor.
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