最后从金属材料的电阻率和电子元件构成属性对构件的电阻损伤参量作了初步探索的研究。
Thereafter, the electrical resistance using for fatigue is given pilot study from the metallic resistor and properties of the electronic elements.
针对超精密光滑光学元件加工过程中容易出现的粗糙度较大和表面疵病较多的现象，对传统抛光机理和抛光过程中抛光粉的主要参量对抛光质量的影响进行了研究。
In view of the phenomena that the easy appearance of serious roughness and surface defects, the polishing mechanism and the influence of the main parameters on the polishing quality are researched.
提出了高频功率磁元件测试新方法和实验电路模型，实现了磁元件模型各参量的确定及铜、铁损等效电阻的分离。
A new testing method of high frequency power magnetic component and its electrical circuit model of measurement is produced.
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