低压化学气相沉积系统 Low Pressure Chemical Vapor Deposition ; LPCVD
化学气相沉积真空系统 CVD ; Chemical Vapor Deposition
本系统中的数字量由PLC控制，数字量主要控制真空系统、烧结炉和化学气相沉积炉中各通气管路中的开关量。
In the system the digital is controlled by PLC, digital is mainly used to control the switch data of pipeline in the vacuum system and metallurgical vessel and CVD vessel.
本文系统研究了石英钟罩式微波等离子体辅助化学气相沉积装置对沉积金刚石薄膜的影响。
In this paper diamond films were deposited using bell-jar type microwave plasma assisted CVD system.
在热丝化学气相沉积金刚石系统中，衬底温度是影响金刚石成膜质量的关键因素之一。
In HFCVD system the substrate temperature is a key factor which deeply affects the quality of diamond films.
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