随后分钟金属芯片熔化和汽化去除，并不断冲刷冲洗介质流体了。
The ensuing minute metal chips are removed by melting and vaporization, and are washed away by the continuously flushing dielectric fluid.
通过对多介质过滤器的构造介绍，着重阐述反冲洗工艺，对生产运行中出现的缺陷，进行分析并提出相应的措施。
Though brief the constitution of more medium filter, expound the technique of re wash, comprehensively analysis the cause of the error, and adopt correspond to measure.
采用串联式波纹管机械密封代替原单端面机械密封，解决了减底泵机械密封冲洗液对介质的影响问题。
The infection of the washing liquid used in the pump at the decompression tower bottom to the medium was introduced.
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