提出了一种用于光刻装置的对准系统。
A novel alignment system is presented for lithographic apparatus.
对准方法，对准基底，光刻装置和器件制造方法。
Aligning method, aligning substrate, photoetching device and component manufacturing method.
光刻装置，器件制造方法，以及由此制造的器件。
Lithographic apparatus, device manufacturing method, and device manufactured thereby.
应用推荐