... photoetch method 光刻技术，光刻法 photoetching material 光刻材料 photoexcitation 光致激发 ...
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通过反应离子刻蚀可以将光刻胶微透镜图形转移至这种高性能的聚合物材料上。
Pattern transfer technique is used to transfer photoresist microlens arrays into the polymer underlayer.
利用SU - 8光刻胶为主要材料，采用多级曝光和电铸金属实现3D结构的工艺技术，研制出了微针执行器的雏形器件。
The rudiments of microneedle actuator have been developed, which is mainly made of SU 8 photoresist, and its 3D construction is fabricated by multistep exposal and electroforming metal.
并且在实验研究的基础上，分析了激光刻蚀金刚石材料的基本规律。
On the basic of theory, experimental studies on laser cutting and polishing diamond film were carried out.
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