作为长波红外低折射率材料，这几种材料在将来都有应用潜力。

All of these materials will be the potential long wavelength infrared low refractive index materials in the future.

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最后，本文又对一种低折射率芯光子晶体光纤基模束缚损耗特性进行了分析。

Lastly, the fundamental mode loss of a special kind of depressed-index core PCF is analyzed.

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由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。

All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).

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