The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.
光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
In IC design under VDSM technology, the crosstalk situation of interconnecting is related nearly with the scheme of detailed routing and the waveforms of signals.
超深亚微米ic设计中互连线的串扰情况与详细布线方案和信号波形密切相关。
As for the SI which is the main problem for VDSM physical design, the design offers a correspondent restraint to crosstalk and antenna while improving power plan.
本项研究针对影响超深亚微米物理设计的主要技术难点信号完整性问题，在提高电源规划质量的同时，分别对串扰效应和天线效应进行了相应的抑制。
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