substrate-to-target distance 靶基相对位置
In addition,the correlation between the deposition rate by sputtering from twin target,target-substrate distance,target-target distance and target’s rotating angle was also calculated.
同时计算了孪生旋转圆柱靶的溅射产额分别与靶基距、靶间距,以及靶旋转角度的相关性。
参考来源 - 旋转圆柱靶溅射沉积产额分布In addition,the effects of substrate temperature,deposition rate,magnetic-field distribution, magnetic-field intensity,minus bias of the target,pressure of the chamber and target-substrate distance on the physical properties of thin film are studied.
本论文研究了基板温度、溅射速率、磁场分布、磁场强度、阴极靶负偏压、真空室内压强以及靶材-基板间距对成膜的影响。
参考来源 - 磁控溅射薄膜生长的计算机模拟研究In RF magnetron sputtering methods, the proper parameters such as working gas, target-substrate distance, annealing temperature and time have important effects on the formation of perovskite.
在射频磁控溅射法中,溅射参数（例如工作气压、靶基距、退火温度和退火时间等）对PMN-PT薄膜钙钛矿相的形成有着非常重要的影响。
参考来源 - PbMg·2,447,543篇论文数据，部分数据来源于NoteExpress
The results showed that the thickness uniformity becomes better along with the increasing target-substrate distance.
研究结果表明，随着靶基距的增加，膜厚均匀性逐渐变好。
The target-substrate distance, the DC power and the sputtering pressure are very important factors for coercivity, on the other hand, the effect of sputtering time is not obvious.
并发现了靶基距、功率和溅射气压对薄膜矫顽力的影响较大，其中靶基距是薄膜矫顽力最主要的控制因素。 而溅射时间在所取的水平上对薄膜矫顽力的影响最小。
We studied the relationship between the films thickness, grain size and deposition parameters, i. e. pulse laser frequency, striking voltage and distance from the target to the substrate.
研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。
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