...低压化学气相沉积;low pressure chemical vapor deposition;LPCVD 射频化学气相沉积;radio-frequency chemical vapor deposition;RFCVD 金属有机化合物化学气相沉积;metal organic compound chemical vapor deposition;MOCVD ..
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Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Silicon nitride thin films were prepared onto steel substrates by radio-frequency plasma enhanced chemical vapor deposition (RF-PECVD) technique.
采用射频等离子体增强化学气相沉积法(RF - PECVD)在钢衬底上沉积氮化硅薄膜。
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