plasma chamber cleaning 等离子腔清洗
plasma welding chamber 等离子焊箱
chamber plasma 反应室等离子体
vacuum plasma welding chamber 等离子真空焊箱
The method comprises monitoring plasma parameters within a plasma chamber and analyzing the resulting information.
该方法包括检测该等离子室内的等离子参数和分析所得到的信息。
The wafer plasma processing chamber is configured to react the reactive radical with a species at a surface of a wafer disposed in the wafer plasma processing chamber.
晶片等离子体加工室的结构设置成使反应性自由基与放置在晶片等离子体加工室内的晶片表面上的物质反应。
The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律,并分析了气压和功率对等离子体分布的影响。
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