CdS nanocrystalline films CdS纳米晶薄膜
ordered Si-based nanocrystalline films 晶粒有序Si基纳米材料
Nanocrystalline diamond films 纳米金刚石薄膜
nanocrystalline Ge thin films 纳米Ge薄膜
Nanocrystalline ZnO films 纳米ZnO薄膜
nanocrystalline Si films 纳米硅溥膜
Nanocrystalline TiO2 films TiO2纳米薄膜
Nanocrystalline silicon films have special structure and many excellent optoelectronic properties, and are supposed to be applied in optoelectronic devices and large scale integrated circuits.
纳米硅薄膜具有独特的结构和许多优异的光电性能,可望应用于新型光电器件、大规模集成电路等领域。
The electron field emission from nanocrystalline diamond films on different substrate materials was investigated.
研究了不同衬底上纳米金刚石膜场电子发射性质。
In argon (ar) gas, nanocrystalline silicon films are prepared by pulsed laser ablation. The influence of ambient pressure on surface morphology of nanocrystalline silicon film is studied.
采用脉冲激光烧蚀技术在氩气环境下制备了纳米硅薄膜,研究了环境气体压强对纳米硅薄膜表面形貌的影响。
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