The characterization of SiN thin films was studied by spectral ellipsometry, reflection spectra, infrared absorption spectroscopy (IR) and quasi-steady state photoconductance (QSSPC) measurements.
利用椭圆偏振光谱、反射谱、红外吸收谱和准稳态光电导（QSSPC）分析了氮化硅薄膜的特性。
The obtained samples were characterized by scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FT-IR), X-ray diffraction (XRD), and thermogravimetric analysis (TGA).
所得样品用扫描电镜(SEM)、傅立叶红外光谱(FT - IR)、X射线衍射(XRD)和热重分析(TG)等分析方法进行了表征。
Then their structures and composing are analyzed by Fourier transform infrared spectroscopy(FT-IR), X-ray diffraction(X-RD), scanning electron microscopy(SEM).
红外光谱、X-射线衍射、扫描电镜分析其结构与组成，对膜进行降解性、溶涨性和兔眼生物相容性实验研究。
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