... Vacuum Thermal Evaporation 真空热蒸发 vacuum evaporation system 真空蒸镀系统 vacuum evaporation coating plant 真空蒸发镀膜设备 ...
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真空热蒸镀法(Vacuum Thermal Evaporation)是应用金属或金属氧化物作为反应源，来沉积各种金属氧化物薄膜。技术关键在于沉积速率、衬底温度、村底与坩埚的距离和氧气分压。
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Tin (Sn) films were prepared by vacuum thermal evaporation on glass substrates, to obtain the SnO_2 nano-films by heat-treatment in air and oxygen (O_2).
采用真空热蒸发法在玻璃衬底制备纳米Sn薄膜,在空气或氧气气氛下对薄膜进行氧化、热处理,获得性能良好的SnO_2纳米多晶薄膜。
参考来源 - 稀土镝、钕、镧掺杂纳米SnOThermo-gravitometric analysis(TGA) shows the stability of these Iridium(Ⅲ) complexes in the range of 338～360℃. And they can be sublimed at low pressure which makes them easily for high-vacuum thermal evaporation films.
热重分析表明,这些2-苯基-苯并噻唑类铱配合物的分解温度在338～360℃,具有较好的热稳定性,有利于真空热蒸镀薄膜的制备。
参考来源 - 铱配合物有机磷光材料的合成及性能研究·2,447,543篇论文数据，部分数据来源于NoteExpress
The sub-electrode is deposited with the vacuum thermal evaporation technique;
利用真空热蒸发的方法在硅基片上制备了波导下电极；
The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.
该薄膜可采用高真空热蒸发、电子束沉积以及溅射等多种镀膜技术制备。
LaF3 single-layer coatings were prepared by thermal boat evaporation at different deposition rates. Some of these films were annealed in vacuum.
用热舟蒸发方法在不同的沉积速率下制备了LaF3单层膜，并对部分单层膜进行了真空退火。
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