The technical advantages of vacuum plasma spray over conventional chemical vapor deposition(CVD) and air plasma spray in tungsten coating were also discussed.
和CVD方法以及常压等离子体喷涂方法制备的钨涂层相比，低压等离子体喷涂具有明显的优势。
The influence of water vapor content in high vacuum chamber during the coating process on physical properties of HfO2 films was investigated.
本文研究了在镀膜过程中真空室内水蒸气的含量对HfO2薄膜物理性能的影响。
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