These conclusions are essential for designing and improving the deposition process of DLC.
这些结论对设计与改进DLC的制备工艺具有重要的指导意义。
Typical of the dopant chemistry is the reaction for arsine, which is depicted with the deposition process in Fig. 9.
砷化三氢的反应是典型的掺杂化学反应,图9显示了该反应的淀积过程。
The occurrence of impurities during the deposition process can also be caused by the evaporation of certain substrate materials.
沉积过程中杂质也可因某些基体材料的蒸发而产生。
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