The position and strength of the peak are affected by the annealed temperature and that seems to be to related to kinds and density of defects.

结合激发谱对相应的激发与发光中心进行了讨论。 另外，还研究了退火温度对其峰位与峰强的影响。

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The higher the annealed temperature and the longer the annealed time, the stronger the new diffraction peaks.

随退火温度的升高和保温时间的增长，新衍射峰增强；

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The LNO thin films annealed at lower temperature have (110) preferred orientation, while the films annealed at higher temperature have (100) preferred orientation.

发现在较低退火温度下得到(110)择优取向的LNO薄膜，较高退火温度下得到(100)择优取向的LNO薄膜。

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