本文利用射频磁控溅射法（radio-frequency magnetron sputtering，RFMS），在石英表面上制备了f轴择优取向的纳 米ZnO薄膜。
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radio frequency magnetron sputtering method 射频磁控溅射法
Radio-Frequency magnetron sputtering system 控溅渡系统
reactive radio-frequency magnetron sputtering 反应磁控溅射
reactive radio frequency magnetron sputtering 反应射频磁控溅射
radio frequency magnetron co-sputtering 射频磁控复合溅射
In this work, highly(111)preferred oriented Ba_(0.3)Sr_(0.7)TiO_3 thin films were fabricated through radio-frequency magnetron sputtering. The influences of sputtering parameters and annealing condition on their microstructure and properties were discussed.
本文应用射频磁控溅射法制备出具备(111)择优取向的Ba_(0.3)Sr_(0.7)TiO_3薄膜,开展了溅射工艺参数和退火条件对薄膜微观结构和性能的影响研究。
参考来源 - 择优取向钛酸锶钡薄膜的制备及其性能研究·2,447,543篇论文数据，部分数据来源于NoteExpress
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
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