... photolithoclear mask光刻用掩模 photolithographic resolution光刻蚀清晰度 photolithography光刻法 ...
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With the rapid development of microelectronic technology in china, photolithographic equipments of high resolution and large field are demanded.
随着我国微电子技术的飞速发展，要求研制分辨率高、工作视场大的光刻设备。
This avoids the need to align multiple photolithographic processing steps, thereby allowing greatly increased resolution and reduced lead spacing.
这避免了需要对准多个光刻处理步骤，由此允许大大提高的分辨率和减小的引线间隔。
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