high dose ion implantation 高剂量离子注入
The READE (Rare Event Algorithm with Dose Effect) method can well speed up the MD simulation of ion implantation with dose effect.
（包含剂量效应的稀有事件算法）方法可以很好的加速含剂量效应的离子注入的分子动力学模拟。
The effect of improving wear resistance by ion implantation depended strongly on the ions, implanting dose, implanting energy and implanting temperature.
离子注入对材料表面耐磨性能改善的效果取决于注入离子的种类、注入剂量、注入能量和注入温度。
Waveguides formed by heavy ions implantation show an unique advantages: the beam dose can be 1-3 order lower than that of light ion implantation and it can reduce the fabrication cost significantly.
利用重离子注入形成光波导表现出独特的优点：与轻离子注入相比，注入剂量可以降低1 ~ 3个数量级，可以大大降低制造成本。
应用推荐