... transparent dielectric layer 透明介质层 dielectric layer ' thickness 介质层厚度 gate dielectric layer 栅极介电层 ...
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An interface layer is formed on the gate dielectric layer.
在栅极电介质层上形成界面层。
In an embodiment, the method includes forming a gate dielectric layer on a semiconductor substrate.
实施例中，本方法包括在半导体衬底上形成栅极电介质层。
The gate dielectric layer is deposited using a plasma enhanced deposition with a gas mixture comprising a silicon and chlorine containing compound.
门电介质沉积层使用气体包括一个芯片和含氯化合物的混合物等离子增强沉积。
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