abstract:Electron Beam Physical Vapor Deposition or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase.
In this paper, prevailing TBC depositiontechnologies, includingplasmaspray, electron beam-physicalvapordeposition, ion beamassisted film deposition and chemicalvapor deposition, are reviewed.