Diamond-like carbon DLC thin films were deposited onto si 100 and high speed steel substrates by mid-frequency magnetron sputtering system SP0806AS, Beijing Power tech Co.
采用SP0806AS中频磁控溅射镀膜机，在硅(100)和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。
This system can be used in research of high-resistance materials such as thin dielectric layers on semiconductors, DLC and piezo-films, conductive polymers etc.
这套系统可以用于研究高电阻的材料，例如在半导体基体上的绝缘薄膜，DLC和压电薄膜，导电聚合物等。
To meet the requirement for the diamond-like carbon thin films with low friction factor, the tungsten-doped diamond-like carbon(W-DLC)thin films prepared through PECVD were studied in depth.
为了满足制备较厚低摩擦系数类金刚石薄膜（DLC）耐磨镀层的实际需求，对在等离子增强化学气相沉积的类金刚石薄膜（W-DLC）中掺钨进行了系统研究。
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