Changes in specular reflectivity, weight loss, surface topograph and potential with time and current-potential curves during chemical polishing were determined.
测定了化学抛光过程中紫铜的表面光反射率、失重、表面形貌和电位随时间的变化以及抛光过程的电流-电位曲线。
The potential-time curves under constant current and cyclic voltammetry curves were measured, and the potential activation process of copper plating on iron substrate in cyanide electrolyte was shown.
进行了恒电流电位-时间曲线和循环伏安曲线的测定，显示了铁电极进行氰化物镀铜时，镀层沉积前铁表面的电位活化过程。
By integrated analysis of curves, when controlled potential is selected at 0.50v, the current responding of the sensor has a better linearity and higher sensitiveness.
通过对三条曲线的综合分析，得出控制电位为0。50v时传感器的电流响应线性度好，灵敏度高。
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