So this thesis will explore the photo resists performance under 90 run design rules firstly. The factors of affect the photo resist characteristic including develop capability, reaction threshold energy, acid diffusion and so on.
所以本文将从KrF光刻胶的主要特性入手,影响光刻胶性能的主要因素有:显影性能,反应阈值能量,光酸扩散,抗刻蚀性能等等,其中与线条的均匀性有关的主要是光酸扩散,所以本文将主要研究KrF光刻胶的光酸扩散特性,其扩散方式主要表现为单高斯扩散。
参考来源 - KrF化学增幅光刻胶在90nm逻辑工艺上的性能评价与优化的工艺条件·2,447,543篇论文数据，部分数据来源于NoteExpress
Objective to evaluate the reliability of a method of measuring the total fluoride in fluoride-containing toothpastes with acid diffusion and fluoride selective electrode.
目的探讨冷酸解离-氟离子电极法测定含氟牙膏中总氟含量的可行性和可靠性。
Conclusion the amount of total fluoride in the calcium containing toothpaste can be detected simply and accurately measured by acid diffusion and fluoride selective electrode.
结论采用冷酸解离-氟离子电极法测定单氟磷酸钠与钙类摩擦剂配伍的含氟牙膏中的总氟含量，具有准确可靠、简便易行的优点。
The mix of humic acid with diffusion agent N have good effect too.
当采用扩散剂N时，与腐殖酸混合使用效果也较好。
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