用该系统检测了仅用CF4作为刻蚀气体刻蚀非晶硅基薄膜的等离子体光发射谱。
The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected.
在诸多轻质衬底薄膜太阳电池中，柔性衬底非晶硅基薄膜太阳电池在很多方面占有优势。
In these solar cells, flexible thin film amorphous silicon solar cells are attached importance for their advantages in many aspects.
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