9 西安理工大学硕士学位论文 非平衡磁控溅射（UBMS）是在磁场中心用铁盘代替磁铁或者通过在靶外部放置通电线 圈产生磁场，使得垂直方向的磁场强度增强，而平行方向的磁场强度减弱，这...
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非平衡磁控溅射(unbalanced magnetron sputtering,UBMS)技术作为一种新型的技术,通过附加的磁场,使阴极靶面的等离子体状态发生较大改变,从而不仅具有普通磁控溅...
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非平衡磁控溅射技术 UBMS
闭合场非平衡磁控溅射 CFUBMS ; closed-field unbalanced magnetron sputtering
采用非平衡磁控溅射 Unbalance Magnetron Sputtering ; UBMS
ECR非平衡磁控溅射 ECR unbalanced magnetron sputtering
用非平衡磁控溅射 Unbalanced Magnetron Sputtering
非平衡磁控溅射系统 Unbalanced magnetron sputtering system
There is a biggish working chamber in closed-field unbalanced magnetron sputtering deposition system, and it’s very possible for substrate-placed position to affect the quality of coatings markedly.
闭合场非平衡磁控溅射镀膜设备真空腔尺寸较大,工位很有可能显著影响镀层的质量。
参考来源 - 靶基相对位置对C/Cr复合镀层性能和组织结构的影响The multicomponent CrAlTiN coatings was deposited by close field unbalance magnetron sputtering ion plate physical vapor deposition (PVD) technique. The coatings characteristics and cutting performances of coated tools were studied.
本文采用先进的闭合场非平衡磁控溅射离子镀复合PVD技术,制备了CIAlTiN多元复合涂层,对刀具涂层特性及涂层刀具的切削性能进行了研究。
参考来源 - 多元复合涂层高速钢刀具切削性能研究——干式钻削时的磨损规律和失效机理In this paper Ti/TiN multilayer films with periods from 100nm to 350nm were synthesized by unbalanced magnetron sputtering.
本文采用非平衡磁控溅射技术制备了100nm～350nm调制周期的Ti／TiN多层薄膜。
参考来源 - Ti·2,447,543篇论文数据，部分数据来源于NoteExpress
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