X射线衍射仪、电子能谱仪、原子力显微镜和椭圆偏振仪等研究薄膜的击穿电压、介电常数、晶体结构、化学成分、表面形貌及薄膜的折射率。
The breakdown voltage, permittivity, crystal structure, composition, surface and refractive index of the thin films were studied by I-V, C-V, XRD, EDS, AFM and elliptical polarization instrument.
采用光学显微镜、扫描电子显微镜、能谱和X射线衍射仪分析了梯度材料各层及界面微观组织、相组成和元素分布。
The microstructure and phase composition of each layer as well as component distribution of elements across the interfaces of the layers were analyzed by means of OM, SEM, EDS and XRD.
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