简要介绍了低温等离子体清洗设备清洗机理、特点及其应用。
The plasma theory, plasma cleaning mechanisms and applications for plasma cleaning system are described.
实验中采用了氢氮混合等离子体清洗的方法，提高了清洗的质量。
A better result is got when cleaning sapphire by the plasma of hydrogen mixed with nitrogen.
最后讨论了在经过校温的系统上进行蓝宝石衬底的氢氮等离子体清洗实验，并通过RHEED图像评价清洗结果质量。
The cleaning of hydrogen and nitrogen ECR plasma on sapphire substrates are carried out in the calibrated temperature system and evaluated by analyzing RHEED image in ECR-PEMOCVD system.
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