可以使用氦离子显微镜进行离子散射能谱分析，从而将这项灵敏度最高的表面技术应用于同时要求具有空间分辨率的分析任务中。
Ion scattering spectroscopy can be carried out with HIM, allowing this most surface sensitive technique to be applied to analysis tasks where spatial resolution is also required.
离子注入后进行了氧化试验，并结合X射线衍射和卢瑟福背散射进行了分析。
X ray diffraction and Rutherford Back Scattering techniques were adopted to investigate and analyze the oxidation characteristics of the films.
用卢瑟福背散射谱分析了稀土离子在多孔硅薄膜中的分布情况。
The distribution of rare earth ions embedded into porous silicon films was observed by Rutherford backscattering spectrometry.
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