• magnetron co-sputtering - 引用次数：4

  Some important results obtained are as following:(1) C-containing (or Si-containing) silicon oxide film has been fabricated using the compound-target magnetron co-sputtering technique.

  本论文的主要研究工作和研究结果如下：(1)采用复合靶磁控共溅射法制备了含纳米碳粒和纳米硅粒的氧化硅薄膜。

  参考来源 - 纳米复合掺杂氧化硅薄膜的光电特性及机理研究
• magnetron co-sputtering - 引用次数：1

  参考来源 - 基片温度对Co掺杂ZnO薄膜室温铁磁性的影响 The Effect of Substrate Temperature on the Room Temperature Ferromagnetism of Co

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