射频反应磁控溅射制备氮化铜薄膜 - TNMSC 关键字: 氮化铜薄膜；晶体结构；光学带隙；电阻率[gap=1136]Key words: copper nitride thin films; crystal structure; optical band gap; resistivity
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...氮化铜薄膜；射频磁控溅射；表面形貌；电阻率；光学带隙；显微硬度 中图分类号：O484文献标识码：A文章编号：1000985X（2006）03063506 [gap=1264]Key words：copper nitride film; RF magnetron sputtering; surface morphology; electrical resistivity; optical e..
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氮化铜薄膜的光学性能及其突出的低温热分解特性，使得它在信息存储方面有广阔的应用前景。
The optical property and excellent character of low-temperature thermal decomposition of the copper nitride thin film make it has potential applications in the information storage.
本文概述了国际上制备多晶态氮化铜薄膜的研究进展及其物理性能，并对其应用前景进行展望。
This paper reviews the progress in synthesizing polycrystalline copper nitride film and its experimental results. And the prospects for the potential applications are also presented.
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