采用13.56MHz射频等离子体聚合装置,以六甲基二硅氧烷(HMDSO)和四甲基硅氧烷(TMDSO)为单体、氧气以及氯气为反应气体、氩气为电离气体,在载玻片、单晶硅片、PET等基材上沉积硅氧氮薄膜。
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八甲基环四硅氧烷 Octamethyl cyclotetrasiloxane ; OMCTS ; Octamethyl cyclotetra ; Octamethyl
四甲氧基硅烷 TMOS ; Tetramethoxysilane ; methyl silicate
四甲基二硅氧烷 TMDSO ; Tetramethyldisiloxane ; SITOA ; DATM
十甲基四硅氧烷 Decamethyltetrasiloxane
环四聚二甲基硅氧烷 Cyclotetrasiloxane
十四甲基六硅氧烷 tetradecamethylhexasiloxane
四甲基二氢二硅氧烷 Siloxane HSi
利用微波等离子体化学气相沉积方法，以H 2、CH4和八甲基环四硅氧烷(D4)为原料，在硬质合金基体上沉积了金刚石涂层。
Diamond coatings were deposited on cemented carbide substrates with H2, CH4 and D4 as precursors by using microwave plasma chemical vapor deposition technique.
采用七甲基乙烯基环四硅氧烷和丙烯酸酯类单体，用乳液聚合的方法同时对明胶改性制作皮革涂饰剂。
In the research, organic silicon and acrylic esters were used to modify the gelatin as leather finishing coatings.
然后在四甲基氢氧化铵催化下与正硅酸乙酯反应，制得笼状乙烯基倍半硅氧烷；
Then the new cage-like vinyl silsesquioxanes(VS) were synthesized by the reaction of vinyl-tetra-coordinate silicon with tetraethyl orthosilicate in the condition of tetramethyl ammonium hydroxide.
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